Samsung Delays High NA EUV Adoption Until 1nm Chip Production
Samsung plans to introduce High NA EUV lithography for its 1nm class process technology rather than using the expensive machines for earlier 2nm or 1.4nm nodes. The change reflects a more cautious approach to ASML’s newest lithography systems, which use a higher numerical aperture to print smaller chip features. Samsung had previously expected to use High NA EUV for volume production at more advanced